CVD furnace (also known as the chemical vapor deposition furnace) is a technology that uses plasma to activate the reaction gas to promote the
formation of a solid film on the surface of the substrate.The principle is that under the action of high frequency or DC electric field, the source gas is
ionized to form plasma, the substrate is immersed in the plasma or placed under the plasma, and the reactive particles adsorbed on the surface of
the substrate are bombarded by high-energy electrons, and the bonding bonds are broken into active particles. ,The chemical reaction produces a
solid film, which is then cured by high temperature heating.