Purchaser: A scientific research institute in France
Production unit: Henan Sante Furnace Technology Co., Ltd.
A new preparation technology that uses the strong chemical activity of plasma to improve the reaction conditions to make the gaseous substances containing thin films react chemically and realize the growth of thin film materials, and finally obtain the desired thin film on the substrate.Which is suitable for processing at 1200 °C Deposition of SiO2.SiNx Thin Film.
Maximum temperature: 1200 ℃
Working temperature: 1100 ℃
Furnace tube size: 100*1200mm (tube outer diameter*length)
Heating element: HRE resistance wire
The custom-made large-diameter powder rotary kiln from Belgium has arrived in the hands of the customer in three months. We have repeatedly communicated with the customer to confirm the working conditions proposed by the customer to ensure that the customer’s powder can be rotated and sintered in the furnace when sintering, so that the material can be sintered more fully
Spain customer stayed in Sante Furnace company for three days.
Becasue he is not sure about his process technical and he wants to test his samples in our CVD tube furnace. We would like to help customer solve all of the questions. We meet all of cusotmer request on the gas and vacuum condition.
he vertical three temperature zone tube furnace customized by Chilean customers has been customized according to the customer’s working conditions and needs. It is light, does not occupy space, and is easy to move. After receiving the product
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